Impulse stimulated “explosive” crystallization of sputter deposited amorphous (In,Ga)Sb films
- 31 July 1978
- journal article
- Published by Elsevier in Solid State Communications
- Vol. 27 (1), 17-20
- https://doi.org/10.1016/0038-1098(78)91041-4
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Interlayer diffusion in InSb/GaSb superlattice structure grown by multitarget rf sputteringApplied Physics Letters, 1977
- Multitarget sputtering using decoupled plasmasJournal of Applied Physics, 1976
- Epitaxial growth of In1−xGaxSb thin films by multitarget rf sputteringJournal of Applied Physics, 1976
- On the explosive semiconductor-semimetal transition of antimonyPhysica Status Solidi (a), 1975
- Observations on the “explosive” crystallization of non-crystalline GeSolid State Communications, 1975
- ‘Shock-crystallization’ on the basis of a domino-type modelSolid State Communications, 1974
- Phenomenology of the “explosive” crystallization of sputtered non-crystalline germanium filmsJournal of Materials Science, 1973
- Heat-radiation from shock-crystallization of sputtered amorphous germanium filmsSolid State Communications, 1973