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The Effect of rf-Power Dissipation on the Temperature of Substrate in a rf-Sputtering System
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The Effect of rf-Power Dissipation on the Temperature of Substrate in a rf-Sputtering System
The Effect of rf-Power Dissipation on the Temperature of Substrate in a rf-Sputtering System
NH
Naokichi Hosokawa
Naokichi Hosokawa
MN
Masashi Nakatsukasa
Masashi Nakatsukasa
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1 January 1973
journal article
Published by
The Vacuum Society of Japan
in
SHINKU
Vol. 16
(9)
,
327-335
https://doi.org/10.3131/jvsj.16.327
Abstract
No abstract available
Keywords
SPUTTERING SYSTEM
RF SPUTTERING
RF POWER
POWER DISSIPATION
TEMPERATURE
EFFECT OF RF
SUBSTRATE
Cited by 3 articles