Electron attachment in dilute fluorine-helium mixtures
- 15 March 1978
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 32 (6), 351-353
- https://doi.org/10.1063/1.90055
Abstract
We have made an absolute determination of the electron attachment coefficient η (cm−1) in helium containing 0.1–1% fluorine covering an E/N range from 3Td–17Td. At an estimated average energy of 5 eV we find a rate coefficient equal to (7.5±1.5) ×10−10 cm3/sec.Keywords
This publication has 18 references indexed in Scilit:
- Gain and fluorescence measurements in photoionization-stabilized XeF discharge lasers operating at high-energy loadingsApplied Physics Letters, 1977
- Diffraction-limited KrF and XeF lasers with a negative-branch unstable resonatorApplied Physics Letters, 1977
- 1-μs laser pulses from XeFApplied Physics Letters, 1977
- Ultraviolet-preionized discharge-pumped lasers in XeF, KrF, and ArFApplied Physics Letters, 1976
- Active mode locking of the XeF laserApplied Physics Letters, 1976
- Fast-discharge-initiated KrF laserApplied Physics Letters, 1976
- High power uv noble-gas-halide laserfApplied Physics Letters, 1976
- 354-nm laser action on XeFApplied Physics Letters, 1975
- Vibrational relaxation theories and measurementsReviews of Modern Physics, 1975
- Pulsed HF chemical laser with high electrical efficiencyApplied Physics Letters, 1973