Transparent conducting p-type NiO thin films prepared by magnetron sputtering
- 1 December 1993
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 236 (1-2), 27-31
- https://doi.org/10.1016/0040-6090(93)90636-4
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Sintering of LixMi1−xO solid solutions at 1200°CJournal of Materials Science, 1992
- Correlated barrier hopping in NiO filmsPhysical Review B, 1991
- As-sputtered electrochromic films of nickel oxideJournal of Vacuum Science & Technology A, 1991
- Electrochromic Behavior of Nickel Oxide Electrodes: I . Identification of the Colored State Using Quartz Crystal MicrobalanceJournal of the Electrochemical Society, 1991
- Electrochromic hydrated nickel oxide coatings for energy efficient windows: Optical properties and coloration mechanismApplied Physics Letters, 1986
- Visible-Light Injection-Electroluminescent a-SiC/p-i-n DiodeJapanese Journal of Applied Physics, 1985
- Highly Conductive and Transparent Aluminum Doped Zinc Oxide Thin Films Prepared by RF Magnetron SputteringJapanese Journal of Applied Physics, 1984
- Semiconducting transparent thin films: their properties and applicationsJournal of Materials Science, 1984
- Transparent conductors—A status reviewThin Solid Films, 1983
- Electrical and Optical Properties of Narrow-Band MaterialsPhysical Review B, 1970