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Preferential SiO
2
Etching on Si Substrate by Plasma Reactive Sputter Etching
Home
Publications
Preferential SiO
2
Etching on Si Substrate by Plasma Reactive Sputter Etching
Preferential SiO
2
Etching on Si Substrate by Plasma Reactive Sputter Etching
SM
Seitaro Matsuo
Seitaro Matsuo
YT
Yumiko Takehara
Yumiko Takehara
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1 January 1977
journal article
Published by
IOP Publishing
in
Japanese Journal of Applied Physics
Vol. 16
(1)
,
175-176
https://doi.org/10.1143/jjap.16.175
Abstract
No abstract available
Cited by 25 articles