Nitrogen doping and structural properties of amorphous carbon films deposited by pulsed laser ablation
- 2 May 2002
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 197-198, 542-546
- https://doi.org/10.1016/s0169-4332(02)00332-x
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- An EPR study of defects in hydrogenated amorphous carbon thin filmsDiamond and Related Materials, 1998
- Synthesis of carbon nitride films at low temperaturesJournal of Vacuum Science & Technology A, 1997
- Plasma deposition of hydrogenated amorphous carbon: growth rates, properties and structuresThin Solid Films, 1994
- Nitrogen doping of highly tetrahedral amorphous carbonPhysical Review B, 1993
- Chemical Preparation and Shock Wave Compression of Carbon Nitride PrecursorsJournal of the American Ceramic Society, 1990
- Amorphous carbonAdvances in Physics, 1986