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Semi-Insulating Polycrystalline-Silicon (SIPOS) Films Applied to MOS Integrated Circuits
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Semi-Insulating Polycrystalline-Silicon (SIPOS) Films Applied to MOS Integrated Circuits
Semi-Insulating Polycrystalline-Silicon (SIPOS) Films Applied to MOS Integrated Circuits
HM
Hidenobu Mochizuki
Hidenobu Mochizuki
TA
Teruaki Aoki
Teruaki Aoki
HY
Hisayoshi Yamoto
Hisayoshi Yamoto
MO
Masanori Okayama
Masanori Okayama
MA
Motoaki Abe
Motoaki Abe
TA
Tetsuo Ando
Tetsuo Ando
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1 January 1976
journal article
Published by
IOP Publishing
in
Japanese Journal of Applied Physics
Vol. 15
(S1)
,
41
https://doi.org/10.7567/jjaps.15s1.41
Abstract
No abstract available
Keywords
INTEGRATED CIRCUITS
SEMI INSULATING
INSULATING POLYCRYSTALLINE
MOS INTEGRATED
FILMS APPLIED
POLYCRYSTALLINE SILICON
SIPOS
Cited by 41 articles