Rapid nondestructive thickness measurement of opaque thin films on anisotropic substrates
- 2 January 1986
- journal article
- Published by Institution of Engineering and Technology (IET) in Electronics Letters
- Vol. 22 (1), 53-54
- https://doi.org/10.1049/el:19860036
Abstract
A rapid, nondestructive opaque thin-film thickness measurement system is presented which takes into account the anisotropy of the sample under study and the geometry of the minature acoustic probe. Experimental results obtained using this system on W/Si (100) samples are in good agreement with those made using the Rutherford backscattering technique.Keywords
This publication has 1 reference indexed in Scilit:
- Concepts of Backscattering SpectrometryPublished by Elsevier ,1978