Crystallization of amorphous silicon films by Nd:YAG laser heating
- 15 August 1975
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 27 (4), 224-226
- https://doi.org/10.1063/1.88437
Abstract
We have converted amorphous Si films into crystalline Si by heating with focused Nd:YAG laser radiation. The films were scanned by a focused laser beam and then studied by reflection electron microscopy and x‐ray diffraction. These studies indicate that crystallite sizes as large as 25 μm were produced and suggest that a crystallization technique using a scanned laser beam focused to a slit image could be useful in preparing large‐grain Si films for photovoltaic cells.Keywords
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