Deceleration ion optical system for sputtering measurements between 50 and 500 eV as function of angle of incidence
- 1 October 1987
- journal article
- research article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 58 (10), 1830-1832
- https://doi.org/10.1063/1.1139527
Abstract
A deceleration system for a parallel ion beam in the energy range of 50 to 500 eV is described. The system is used for sputtering yield measurements as a function of the angle of ion incidence. Measured yield data for Cu and Au sputtered by 100‐ and 300‐eV D+ ions are reported and compared to computer calculations. Experimental and calculated data show only a weak dependence on the angle of incidence. However, at glancing incidence the experimental values are larger up to a factor of 2 compared to the calculated ones. This is attributed to the surface roughness not included in the calculations.Keywords
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