Photogeneration of polymeric amines: synthesis, photocrosslinking and photoimaging of copolymers containing photoactive carbamate pendant groups
- 1 January 1992
- journal article
- research article
- Published by Royal Society of Chemistry (RSC) in Journal of Materials Chemistry
- Vol. 2 (8), 811-816
- https://doi.org/10.1039/jm9920200811
Abstract
Two families of copolymers containing 4-[(2-nitrobenzyloxy)carbamoyl]styrene as the photoactive component, with styrene or methyl methacrylate as the other component are described. The polymers are prepared by chemical modification of copolymers of 4-aminostyrene with styrene and methyl methacrylate, respectively, using 2-nitrobenzyl chloroformate. The photoactive carbamate groups of both copolymers can be removed by irradiation with UV light below 320 nm. Quantum-yield measurements and comparisons with small-molecule model compounds confirm that attachment to the polymer has no effect on the photolability of the 2-nitrobenzylcar-bamoyl protecting group. Quantum-yield values near 0.10 also compare favourably with those obtained for related small molecules. The photoactive polymers have been tested successfully in the UV-induced crosslinking of formulations containing epoxy groups.Keywords
This publication has 13 references indexed in Scilit:
- Solid state quantum yield determination of a novel base photogeneratorJournal of Photochemistry and Photobiology A: Chemistry, 1991
- Photogeneration of organic bases from o-nitrobenzyl-derived carbamatesJournal of the American Chemical Society, 1991
- Photogenerated amines and their use in the design of a positive-tone resist material based on electrophilic aromatic substitutionJournal of Materials Chemistry, 1991
- Base catalysis in imaging materials. 1. Design and synthesis of novel light-sensitive urethanes as photoprecursors of aminesThe Journal of Organic Chemistry, 1990
- o-Nitrobenzyl alcohol, a simple and efficient reagent for the photoreversible protection of aldehydes and ketonesJournal of the Chemical Society, Chemical Communications, 1985
- The Effect of Substituents on the Photosensitivity of 2‐Nitrobenzyl Ester Deep U.V. ResistsJournal of the Electrochemical Society, 1983
- Photosensitive protecting groups of amino sugars and their use in glycoside synthesis. 2-Nitrobenzyloxycarbonylamino and 6-nitroveratryloxycarbonylamino derivativesThe Journal of Organic Chemistry, 1974
- o-Nitrophenylethylene Glycol: a Photosensitive Protecting Group for Aldehydes and KetonesCanadian Journal of Chemistry, 1974
- Der α.α‐Dimethyl‐3.5‐dimethoxybenzyloxycarbonyl (Ddz)‐Rest, eine photo‐ und säurelabile Stickstoff‐Schutzgruppe für die PeptidchemieEuropean Journal of Organic Chemistry, 1972
- Photosensitive protecting groupsJournal of the American Chemical Society, 1970