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Ion-Bombardment-Induced Improvement of Photoresist Mask Properties for RF Sputter-Etching
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Publications
Ion-Bombardment-Induced Improvement of Photoresist Mask Properties for RF Sputter-Etching
Ion-Bombardment-Induced Improvement of Photoresist Mask Properties for RF Sputter-Etching
YI
Yasuo Iida
Yasuo Iida
HO
Hidekazu Okabayashi
Hidekazu Okabayashi
KS
Katsumi Suzuki
Katsumi Suzuki
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1 August 1977
journal article
Published by
IOP Publishing
in
Japanese Journal of Applied Physics
Vol. 16
(8)
,
1313-1318
https://doi.org/10.1143/jjap.16.1313
Abstract
No abstract available
Keywords
ION BOMBARDMENT
MASK
PHOTORESIST
ETCHING
SPUTTER
BOMBARDMENT INDUCED IMPROVEMENT
Cited by 11 articles