Structural and Optical Properties of CVD Thin Tungsten Oxide Films
- 1 December 1999
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 176 (2), 969-984
- https://doi.org/10.1002/(sici)1521-396x(199912)176:2<969::aid-pssa969>3.0.co;2-9
Abstract
No abstract availableKeywords
This publication has 23 references indexed in Scilit:
- Electrochromic behavior in CVD grown tungsten oxide filmsJournal of Crystal Growth, 1999
- Deposition of Electrochromic Tungsten Oxide Thin Films by Plasma‐Enhanced Chemical Vapor DepositionJournal of the Electrochemical Society, 1997
- ElectrochromismPublished by Wiley ,1995
- APCVD - In-Situ Growing and Investigation of Electrochromic WO3FilmsMRS Proceedings, 1995
- Spectroscopic Properties of WO3 Thin Films: Polarized FT-IR/ATR, X-Ray Diffraction, and Electronic AbsorptionApplied Spectroscopy, 1994
- Electrochromic Properties of Tungsten Trioxide Thin Films Prepared by Chemical Vapor DepositionJournal of the Electrochemical Society, 1994
- The Structural Changes of Indium-Tin Oxide and a-WO3 Films by Introducing Water to the Deposition ProcessesJapanese Journal of Applied Physics, 1991
- Study on the optical and electrochromic properties of polycrystalline WO3 thin films prepared by CVDSolar Energy Materials, 1988
- Electron Microscopy and Diffraction Studies of the Structure of Amorphous WO3 FilmJapanese Journal of Applied Physics, 1985
- Chemical and electrochemical stability of WO3 electrochromic films in liquid electrolytesJournal of Electronic Materials, 1978