Hetero-Epitaxial Growth of Lower Boron Phosphide on Silicon Substrate Using PH₃-B₂H₆-H₂System

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1 October 1973

journal article
Published by IOP Publishing in Japanese Journal of Applied Physics

Vol. 12 (10), 1504-1509
https://doi.org/10.1143/jjap.12.1504

Abstract

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Cited by 16 articles