LPE Growth of In1-xGaxAs1-yPy with Narrow Photoluminescence Spectrum on GaAs (111)B Substrates
- 1 November 1982
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 21 (11A), L667
- https://doi.org/10.1143/jjap.21.l667
Abstract
The growth conditions of In1-x Ga x As1-y P y , layers on GaAs (111)B substrate and the photoluminescence (PL) properties of these layers are described. The temperature difference liquid phase epitaxial (LPE) method was used for crystal growth. Single PL peak corresponding to band-to-band transition was observed from the layers over the range of 1.73\lesssimE g\lesssim1.98 eV at 77 K. The half width of the PL band was less than 20 meV and independent of the peak energy. These results show that the grown layers have good crystalline qualities.Keywords
This publication has 13 references indexed in Scilit:
- Miscibility gaps in quaternary III/V alloysJournal of Crystal Growth, 1982
- Photoluminescence Processes of Zn-Doped In1-xGaxP with 0.6<x<1.0Japanese Journal of Applied Physics, 1982
- Growth and characterization of InGaAsP lattice-matched to InPJournal of Materials Science, 1981
- Fabrication and Visible-Light-Emission Characteristics of Room-Temperature-Operated InGaPAs DH Diode Lasers Grown on GaAs SubstratesJapanese Journal of Applied Physics, 1981
- Influence of supersaturated melt for InP growth on InP-InGaAsP interface of double-heterostructure laser wafersJournal of Applied Physics, 1981
- Instability of In-Ga-As-P Liquid Solution during Low Temperature LPE of In1-xGaxAs1-yPy on InPJapanese Journal of Applied Physics, 1981
- Electrical Properties of Zn-Doped In1-xGaxPJapanese Journal of Applied Physics, 1980
- LPE Growth and Luminescence of In1-xGaxPyAs1-y on (1, 0, 0) GaAs with Band-Gap Energy in Region of 1.569 eV≤Eg≤1.893 eVJapanese Journal of Applied Physics, 1980
- Barrier Parameters of Tungsten-Nickel Point Contact DiodesJapanese Journal of Applied Physics, 1980
- Nearly perfect crystal growth of III–V compounds by the temperature difference method under controlled vapour pressureJournal of Crystal Growth, 1975