Product Quantum Yields from the Photolysis of NO2 at 366 nm in the Presence of Ethylene. ‐ The Role of NO3*
- 1 March 1979
- journal article
- Published by Wiley in Berichte der Bunsengesellschaft für physikalische Chemie
- Vol. 83 (3), 217-225
- https://doi.org/10.1002/bbpc.19790830307
Abstract
No abstract availableKeywords
This publication has 32 references indexed in Scilit:
- Primary Processes in the Photolysis of NO2Berichte der Bunsengesellschaft für physikalische Chemie, 1975
- Photochemistry of NOx and HNOx CompoundsCanadian Journal of Chemistry, 1974
- Nitrous acid in the atmosphere and laboratory experiments on its photolysisTellus, 1974
- Absolute Rate Constants for the Reactions of O(3P) Atoms with C2H4 and C2D4The Journal of Chemical Physics, 1972
- Gas-Phase Reaction of NO2 and Ethylene at 25°CThe Journal of Chemical Physics, 1972
- Reaction of Hydrogen Atoms with C2H4 and C2D4The Journal of Chemical Physics, 1971
- Oxidation of Ethylene by the Photolysis of NO2 at 25°CThe Journal of Chemical Physics, 1968
- The Photochemistry of Nitrogen Dioxide at 3130 and 4050 Å.Journal of the American Chemical Society, 1962
- PHOTOOXIDATION OF BUTENES BY NITROGEN DIOXIDE AT DIFFERENT WAVE LENGTHSCanadian Journal of Chemistry, 1958
- The Photolysis of Nitrogen Oxides: N2O5, N2O4 and NO2Journal of the American Chemical Society, 1934