Silicon oxide thin films obtained by Ar+ bombardment of Si(100) in oxygen atmosphere at room temperature
- 1 August 1996
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 116 (1-4), 416-419
- https://doi.org/10.1016/0168-583x(96)00080-8
Abstract
No abstract availableKeywords
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