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SiO2 films deposited on Si by an ionized cluster beam
Home
Publications
SiO2 films deposited on Si by an ionized cluster beam
SiO2 films deposited on Si by an ionized cluster beam
YM
Y. Minowa
Y. Minowa
KY
K. Yamanishi
K. Yamanishi
KT
K. Tsukamoto
K. Tsukamoto
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1 October 1983
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science & Technology B
Vol. 1
(4)
,
1148-1151
https://doi.org/10.1116/1.582654
Abstract
No abstract available
Cited by 15 articles