The creation of metastable defects in a-Si:H films by high dose irradiation with keV-electrons
- 1 December 1987
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 97-98, 795-798
- https://doi.org/10.1016/0022-3093(87)90190-6
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Light-induced metastable defects in hydrogenated amorphous silicon: A systematic studyPhysical Review B, 1985
- Metastable defects in amorphous silicon alloysJournal of Non-Crystalline Solids, 1984
- Reversible conductivity changes in discharge-produced amorphous SiApplied Physics Letters, 1977