Dislocation Generation at Si3 N 4 Film Edges on Silicon Substrates and Viscoelastic Behavior of SiO2 Films
- 1 June 1979
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 126 (6), 1014-1019
- https://doi.org/10.1149/1.2129166