The effects of concurrent oxygen ion bombardment on ion beam sputtered Y1Ba2Cu3Ox thin films
- 1 December 1990
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 193-194, 832-840
- https://doi.org/10.1016/0040-6090(90)90236-7
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- 1.5 References for 1Published by Springer Nature ,2005
- I n s i t u epitaxial growth of Y1Ba2Cu3O7−x films by molecular beam epitaxy with an activated oxygen sourceApplied Physics Letters, 1988
- As-Deposited Superconducting Ba2YCu3O7-y Films Using ECR Ion Beam OxidationJapanese Journal of Applied Physics, 1988
- Processing of La1.8Sr0.2CuO4 and YBa2Cu3O7 superconducting thin films by dual-ion-beam sputteringJournal of Applied Physics, 1988
- Constructive Metatheory: 1. Basic Features and Historical FoundationsInternational Journal of Personal Construct Psychology, 1988
- Aluminum substitution in YPhysical Review B, 1987
- Oxygen stoichiometry in Ba2YCu3OxMaterials Research Bulletin, 1987
- Backscattering of neutralized noble gas ions from polycrystalline surfaces at bombarding energies below 1 keVNuclear Instruments and Methods, 1976