Influence of deposition parameters on the optical and structural properties of TiO2 films produced by reactive d.c. plasmatron sputtering
- 23 September 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 83 (2), 239-245
- https://doi.org/10.1016/0040-6090(81)90673-8
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Features of and IN SITU measurements on absorbing TiOx films produced by reactive d.c. magnetron-plasmatron sputteringThin Solid Films, 1980
- Reactively sputtered oxide optical coatings for inertial confinement fusion laser componentsThin Solid Films, 1979
- A simple method for the determination of the optical constants n, k and the thickness of a weakly absorbing thin filmJournal of Physics E: Scientific Instruments, 1976
- Growth of titanium oxide crystals of controlled stoichiometry and orderJournal of Crystal Growth, 1972