Characterization and Electrochemical Responsiveness of Boron-Doped Nanocrystalline Diamond Thin-Film Electrodes
- 30 January 2003
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 15 (4), 879-888
- https://doi.org/10.1021/cm020927t
Abstract
No abstract availableKeywords
This publication has 37 references indexed in Scilit:
- Aliphatic polyamine oxidation response variability and stability at boron-doped diamond thin-film electrodes as studied by flow-injection analysisAnalytica Chimica Acta, 2001
- Standard Electrochemical Behavior of High-Quality, Boron-Doped Polycrystalline Diamond Thin-Film ElectrodesAnalytical Chemistry, 2000
- Polycrystalline diamond electrodes: basic properties and applications as amperometric detectors in flow injection analysis and liquid chromatographyAnalytica Chimica Acta, 1999
- Photoelectrochemical Determination of the Flatband Potential of Boron-Doped DiamondElectrochemical and Solid-State Letters, 1999
- Role of bonding and coordination in the atomic structure and energy of diamond and silicon grain boundariesJournal of Materials Research, 1998
- Control of Electron Transfer Kinetics at Glassy Carbon Electrodes by Specific Surface ModificationAnalytical Chemistry, 1996
- Raman and photoluminescence analysis of stress state and impurity distribution in diamond thin filmsJournal of Applied Physics, 1995
- Sodium alkyl sulfate induced deposition of methyl viologen cation radical on glassy carbon surfacesLangmuir, 1992
- Characterization of diamond films by Raman spectroscopyJournal of Materials Research, 1989
- Raman scattering characterization of carbon bonding in diamond and diamondlike thin filmsJournal of Vacuum Science & Technology A, 1988