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Plasma-based dry etching techniques in the silicon integrated circuit technology
Home
Publications
Plasma-based dry etching techniques in the silicon integrated circuit technology
Plasma-based dry etching techniques in the silicon integrated circuit technology
G. S. Oehrlein
G. S. Oehrlein
JR
J. F. Rembetski
J. F. Rembetski
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1 March 1992
journal article
Published by
IBM
in
IBM Journal of Research and Development
Vol. 36
(2)
,
140-157
https://doi.org/10.1147/rd.362.0140
Abstract
No abstract available
Cited by 36 articles