Measurement of the density and translational temperature of Si(3p21D2) atoms in RF silane plasma using UV laser absorption spectroscopy
- 1 November 1991
- journal article
- Published by IOP Publishing in Measurement Science and Technology
- Vol. 2 (11), 1017-1020
- https://doi.org/10.1088/0957-0233/2/11/002
Abstract
Determination of the absorption profile of the Si 288.2 nm line (3p2 1D2-3p4s 1P1 transition) in the radio frequency SiH4/Ar plasma generated in a plasma-enhanced chemical vapour deposition chamber was performed by using UV absorption spectroscopy with the second harmonic generation of a ring dye laser excited by a CW argon ion laser as a light source. The Si atom density at the 3p2 1D2 level and the Si translational temperature were obtained from the measured absorption intensity and line width of the absorption coefficient of the 288.2 nm line respectively.Keywords
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