Sputtering of Si with keV Ar+Ions. II. Computer Simulation of Sputter Broadening Due to Ion Bombardment in Depth Profiling
- 1 October 1979
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 18 (10), 1987-1994
- https://doi.org/10.1143/jjap.18.1987