Ellipsometry and the clean surfaces of silicon and germanium
- 31 August 1971
- journal article
- Published by Elsevier in Surface Science
- Vol. 27 (1), 88-106
- https://doi.org/10.1016/0039-6028(71)90163-4
Abstract
No abstract availableThis publication has 23 references indexed in Scilit:
- Ellipsometry—LEED study of the adsorption of oxygen on (011) tungstenSurface Science, 1969
- Ellipsometry in the sub-monolayer regionSurface Science, 1969
- Ellipsometric investigation of physisorption at low temperaturesSurface Science, 1969
- Ellipsometry for Measurements at and below Monolayer CoverageJournal of the Optical Society of America, 1968
- A Comparative Study of Adsorption by Ellipsometric and Radiotracer MethodsThe Journal of Physical Chemistry, 1966
- The adsorption of various gases on clean and oxidized Ge surfacesSurface Science, 1966
- Measurement of oxygen adsorption on silicon by ellipsometryJournal of Physics and Chemistry of Solids, 1965
- An Ellipsometer Investigation of Vapor Adsorption on Etched SiliconJournal of the Electrochemical Society, 1964
- Measurement of the thickness and refractive index of very thin films and the optical properties of surfaces by ellipsometryJournal of Research of the National Bureau of Standards Section A: Physics and Chemistry, 1963
- Optical Constants of Silicon in the Region 1 to 10 evPhysical Review B, 1960