Structure of epitaxed copper deposited by evaporation onto a clean (00.1) face of a titanium crystal
- 1 August 1958
- journal article
- Published by Elsevier in Journal of Physics and Chemistry of Solids
- Vol. 6 (2-3), 271-276
- https://doi.org/10.1016/0022-3697(58)90104-5
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Work-Function Studies of Germanium Crystals Cleaned by Ion BombardmentJournal of Applied Physics, 1957
- The migration of copper atom on the surface of silverPhilosophical Magazine, 1956
- The study of epitaxy in thin surface filmsAdvances in Physics, 1956
- The automatic recording of electron diffraction patterns applied to the study of evaporated copper layersBritish Journal of Applied Physics, 1956
- CVI. The sensitivity of electron diffraction as a means of detecting thin surface films: IJournal of Computers in Education, 1955
- Ion Bombardment-Cleaning of Germanium and Titanium as Determined by Low-Energy Electron DiffractionJournal of Applied Physics, 1955
- Resistance of Titanium to Sulfuric and Hydrochloric Acids Inhibited by Ferric and Cupric IonsJournal of the Electrochemical Society, 1952
- Growth of alkali halide crystals from the vapor phase and from solution onto substrates of micaActa Crystallographica, 1951
- Penetration of Low Speed Diffracted ElectronsPhysical Review B, 1936
- A Method of Obtaining an Intense Beam of Low-Velocity ElectronsJournal of the Optical Society of America, 1927