A comparison of the properties of hard carbon films produced by direct gas deposition and plasma-assisted evaporation
- 5 December 1990
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 43-44, 88-98
- https://doi.org/10.1016/0257-8972(90)90063-i
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Preparation and properties of diamondlike carbon filmsJournal of Vacuum Science & Technology A, 1989
- Graphite formation in diamond film depositionJournal of Vacuum Science & Technology A, 1989
- rf-plasma deposited amorphous hydrogenated hard carbon thin films: Preparation, properties, and applicationsJournal of Applied Physics, 1983