Deposition of device quality a-Si:H films with the hot-wire technique
- 1 December 1993
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 164-166, 87-90
- https://doi.org/10.1016/0022-3093(93)90498-m
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Deposition of device quality, low H content amorphous siliconJournal of Applied Physics, 1991
- A Comparative Study of the Electronic Stability of Hydrogenated Amorphous Silicon and Silicon-Germanium Alloy MaterialJapanese Journal of Applied Physics, 1991
- Interpretation of the saturation behaviour of the metastable defect density created in intrinsic a-Si:H by keV-electron irradiationJournal of Non-Crystalline Solids, 1991