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Properties of Tungsten Film Deposited on GaAs by RF Magnetron Sputtering
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Properties of Tungsten Film Deposited on GaAs by RF Magnetron Sputtering
Properties of Tungsten Film Deposited on GaAs by RF Magnetron Sputtering
NS
Nobuhiko Susa
Nobuhiko Susa
SA
Seigo Ando
Seigo Ando
SA
Sadao Adachi
Sadao Adachi
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1 September 1985
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 132
(9)
,
2245-2250
https://doi.org/10.1149/1.2114329
Abstract
No abstract available
Cited by 14 articles