Deposition of thin films of PZT by a focused ion beam sputtering technique

Abstract

Thin films of PZT have been deposited by an ion beam sputtering technique from a multicomponent target of lead zirconate titanate in an O₂ atmosphere. These films were characterized according to composition, crystal structure, and dielectric and ferroelectric properties. The effect of deposition temperature, heat treatment after deposition, and substrate and target material were investigated.