Metalorganic chemical vapor deposition of PbTiO3 thin films
- 31 October 1988
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 53 (18), 1702-1704
- https://doi.org/10.1063/1.100471
Abstract
PbTiO3 thin films have been grown successfully for the first time by using purely metalorganic precursors, namely, titanium isopropoxide and tetraethyllead. A scanning electron micrograph showed dense and noncolumnar growth with good surface morphology. Temperature‐dependent x‐ray diffraction studies provide evidences for a reversible tetragonal to cubic phase transition around 540 °C. At room temperature, the dielectric constant is about 180.Keywords
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