Vapor Etching of GaAs Single Crystals with HCl Gas
- 1 December 1965
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 4 (12)
- https://doi.org/10.1143/jjap.4.1025
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- A Study of HCl-H[sub 2] and GeCl[sub 4]-H[sub 2] Etching of Germanium Substrates for Epitaxial DepositionJournal of the Electrochemical Society, 1964