Electron-beam lithography with metal colloids: Direct writing of metallic nanostructures

Abstract

We report on the fabrication of metallic nanostructures in the sub-100 nm region by means of electron-beam lithography with metal colloids. A thin organometallic film consisting of surfactant stabilized Pd-colloids $\mathrm{(⩽}$ 3 nm) is directly patterned by electron-beam irradiation. Non-exposed colloids are easily removed by rinsing the sample with appropriate dissolvers. The metallic character of the nanostructures is checked by resistance measurements. We find the morphology and the resistance behavior of the present nanostructured Pd-colloids to be similar to those of granular thin Pd/C films. Accordingly, the metal content of the nanostructures fabricated with Pd-colloids can be estimated.