A compact, inexpensive apparatus for one-sided etching in KOH and HF
- 31 December 1991
- journal article
- Published by Elsevier in Sensors and Actuators A: Physical
- Vol. 29 (3), 209-215
- https://doi.org/10.1016/0924-4247(91)80017-j
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Anisotropic etching of silicon in hydrazineSensors and Actuators, 1988