Reduction of Incubation Period by Employing OH-Terminated Si(001) Substrates in the Atomic Layer Deposition of Al2O3
- 1 September 2004
- journal article
- research article
- Published by American Chemical Society (ACS) in The Journal of Physical Chemistry B
- Vol. 108 (39), 15128-15132
- https://doi.org/10.1021/jp048038b
Abstract
No abstract availableKeywords
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