Multilayer resist methods for nanoimprint lithography on nonflat surfaces
- 1 November 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 16 (6), 3922-3925
- https://doi.org/10.1116/1.590437
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Sub-10 nm imprint lithography and applicationsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997
- Imprint Lithography with 25-Nanometer ResolutionScience, 1996