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Diffusion of Phosphorus in Gallium Melt
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Diffusion of Phosphorus in Gallium Melt
Diffusion of Phosphorus in Gallium Melt
KK
Kunio Kaneko
Kunio Kaneko
MA
Masaoki Ayabe
Masaoki Ayabe
MD
Masoshi Dosen
Masoshi Dosen
KM
Kenji Morizane
Kenji Morizane
SU
Setsuo Usui
Setsuo Usui
NW
Naozo Watanabe
Naozo Watanabe
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1 January 1974
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 121
(4)
,
556-558
https://doi.org/10.1149/1.2401859
Abstract
Crystal growth rate of GaP in the SSD (synthesis, solute diffusion) method is limited by the diffusion process of phosphorus in the gallium melt. The diffusion process was analyzed and the diffusion coefficient was derived as .
Keywords
DIFFUSION
III-V SEMICONDUCTORS
CRYSTAL GROWTH FROM MELT
HIGH-TEMPERATURE EFFECTS
GALLIUM COMPOUNDS
PHOSPHORUS COMPOUNDS
GALLIUM PHOSPHIDE
CRYSTAL GROWTH
DIFFUSION COEFFICIENT
PHOSPHORUS
GALLIUM MELT
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Cited by 30 articles