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Trench isolation prospects for application in CMOS VLSI
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Publications
Trench isolation prospects for application in CMOS VLSI
Trench isolation prospects for application in CMOS VLSI
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R.D. Rung
R.D. Rung
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1 January 1984
proceedings article
Published by
Institute of Electrical and Electronics Engineers (IEEE)
https://doi.org/10.1109/iedm.1984.190785
Abstract
No abstract available
Keywords
DIELECTRIC MATERIALS
CMOS INTEGRATED CIRCUITS
ETCHING
VERY LARGE SCALE INTEGRATION
CAPACITORS
ANISOTROPIC MAGNETORESISTANCE
Cited by 14 articles