SiC-Si3N4 composite coatings produced by plasma-enhanced chemical vapour deposition
- 8 October 1993
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 60 (1-3), 566-570
- https://doi.org/10.1016/0257-8972(93)90154-g
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Adhesion improvements in silicon carbide deposited by plasma enhanced chemical vapour depositionSurface and Coatings Technology, 1991
- Influence of Deposition Temperature, Gas Pressure, Gas Phase Composition, and RF Frequency on Composition and Mechanical Stress of Plasma Silicon Nitride LayersJournal of the Electrochemical Society, 1985
- Imaging of cracks and pores in chemically vapour deposited coatings by electrographic printingSurface Technology, 1979