An electron attachment plasma instability
- 1 November 1973
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 23 (9), 508-510
- https://doi.org/10.1063/1.1654978
Abstract
A new type of plasma instability is described in an electron‐beam ionized discharge. This instability occurs in gas mixtures in which the dissociative attachment rate increases strongly with electric field. It has been observed experimentally in He:H2O 740:20 and in He:CO2 1:1 and 9:1 mixtures. The values of the ionization source function S and of the electric field E at which the wave instability occurs are predicted using a Fourier analysis of the linearized kinetic rate equations. This yields the condition for instability as S < (1/α)[Eδβ/δE) − β]2, where α is the electron‐ion recombination coefficient and β is the electron neutral attachment rate.Keywords
This publication has 6 references indexed in Scilit:
- Recombination rate measurements in nitrogenThe Journal of Chemical Physics, 1973
- Absorbing-Sphere Model for Calculating Ion—Ion Recombination Total Cross SectionsThe Journal of Chemical Physics, 1972
- Electron-Beam-Controlled Electrical Discharge as a Method of Pumping Large Volumes of CO2 Laser Media at High PressureApplied Physics Letters, 1972
- Two-body mutual neutralization rates of O2++ O−, NO++ O−, and Na++ O−obtained with merged beamsJournal of Geophysical Research, 1972
- Ion-Ion Mutual Neutralization Cross Sections Measured by a Superimposed Beam Technique. II. + , + , and +Physical Review A, 1971
- Solvation of the hydrogen ion by water molecules in the gas phase. Heats and entropies of solvation of individual reactions. H+(H2O)n-1 + H2O .fwdarw. H+(H2O)nJournal of the American Chemical Society, 1967