A simple chemical vapour deposition method for depositing thin TiO2 films
- 1 November 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 109 (2), 169-178
- https://doi.org/10.1016/0040-6090(83)90136-0
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- TiO2 Antireflection Coatings by a Low Temperature Spray ProcessJournal of the Electrochemical Society, 1978
- TiO[sub 2] Film Properties as a Function of Processing TemperatureJournal of the Electrochemical Society, 1972
- Lateral AC current flow model for metal-insulator-semiconductor capacitorsIEEE Transactions on Electron Devices, 1965
- preparation, properties and optical applications of thin films of titanium dioxideVacuum, 1952