An investigation of the roughening of silicon(100) surfaces in Cl2 reactive ion etching plasmas by i n s i t u ellipsometry and quadrupole mass spectrometry
- 1 November 1989
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B
- Vol. 7 (6), 1325-1332
- https://doi.org/10.1116/1.584533