Dependence of the silicon nanowire diameter on ambient pressure
- 2 December 1998
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 73 (23), 3396-3398
- https://doi.org/10.1063/1.122778
Abstract
Our present work provides a method to control the diameters of the silicon nanowires. As a dominant experimental parameter, the ambient pressure was controlled between 150 and 600 Torr. It is found that the average size of the silicon nanowires increases with increasing ambient pressure. The mean diameter of the silicon nanowires in our study is proportional to the 0.4 power of ambient pressure. Catalytic nanoparticles and the periodic instability of the nanowires suggest a vapor-liquid-solid growth mechanism. For the growth of nanowires, an explanation of the relationship between the mean diameter of the silicon nanowires and the ambient pressure has been proposed.Keywords
This publication has 11 references indexed in Scilit:
- Nanoscale silicon wires synthesized using simple physical evaporationApplied Physics Letters, 1998
- Synthesis of nano-scale silicon wires by excimer laser ablation at high temperatureSolid State Communications, 1998
- A Laser Ablation Method for the Synthesis of Crystalline Semiconductor NanowiresScience, 1998
- Light Emission from Nanometer-Sized Silicon Particles Fabricated by the Laser Ablation MethodJapanese Journal of Applied Physics, 1996
- Nanometer-sized silicon crystallites prepared by excimer laser ablation in constant pressure inert gasApplied Physics Letters, 1996
- First-principles study of the electronic and optical properties of confined silicon systemsPhysical Review B, 1995
- Mechanisms of visible-light emission from electro-oxidized porous siliconPhysical Review B, 1992
- Bounds on the polymer-length distribution in equilibrium polymerizationPhysical Review B, 1992
- Fundamental aspects of VLS growthJournal of Crystal Growth, 1975
- Periodic instability in whisker growthJournal of Crystal Growth, 1973