Spectroscopic and fast photographic studies of excimer laser polymer ablation
- 1 November 1988
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 64 (9), 4657-4663
- https://doi.org/10.1063/1.341247
Abstract
No abstract availableKeywords
This publication has 24 references indexed in Scilit:
- Ultraviolet laser ablation of polyimide filmsJournal of Applied Physics, 1987
- Direct-etching studies of polymer films using a 157-nm F_2 laserJournal of the Optical Society of America B, 1986
- Photochemical cleavage of a polymeric solid: details of the ultraviolet laser ablation of poly(methyl methacrylate) at 193 nm and 248 nmMacromolecules, 1986
- Dependence of photoetching rates of polymers at 193 nm on optical absorption depthApplied Physics Letters, 1986
- Spectroscopic studies of ArF laser photoablation of PMMAApplied Physics A, 1985
- Excimer laser projection micromachined free-standing polymer filmsOptics and Lasers in Engineering, 1985
- Ablative photodecomposition of polymer films by pulsed far‐ultraviolet (193 nm) laser radiation: Dependence of etch depth on experimental conditionsJournal of Polymer Science: Polymer Chemistry Edition, 1984
- Turbulent Mixing at the Contact Surface in a Driven Shock WavePhysics of Fluids, 1970
- Temperature measurements of C 2 and CN radicals generated in a shock tube, I. Pyrolysis in the absence of oxygenProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1962
- Spectra produced by shock waves, flames and detonationsProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1957