Oxidation of Si3N4 in the Range 1300° to 1500°C
- 1 September 1976
- journal article
- Published by Wiley in Journal of the American Ceramic Society
- Vol. 59 (9-10), 399-403
- https://doi.org/10.1111/j.1151-2916.1976.tb09505.x
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
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- Effect of Oxygen Impurities on the Nitridation of High‐Purity SiliconJournal of the American Ceramic Society, 1973
- Brittle Materials Design, High Temperature Gas TurbinePublished by Defense Technical Information Center (DTIC) ,1973
- The high-temperature oxidation, reduction, and volatilization reactions of silicon and silicon carbideOxidation of Metals, 1972
- The Resistance of Silicon Nitride Ceramics to Thermal Shock and Other Hostile EnvironmentsPublished by Springer Nature ,1971
- Thermogravi metric Study of the Oxidation of ZrB[sub 2] in the Temperature Range of 800° to 1500°CJournal of the Electrochemical Society, 1971
- APPLICATIONS OF SILICON NITRIDEPowder Metallurgy, 1961
- STRUCTURAL ASPECTS OF SILICON NITRIDEPowder Metallurgy, 1961
- DENSE SILICON NITRIDEPowder Metallurgy, 1961