Pressure dependency of the NF3-H2transverse-discharge pulse-initiated HF chemical laser
- 1 July 1973
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Journal of Quantum Electronics
- Vol. 9 (7), 723-730
- https://doi.org/10.1109/jqe.1973.1077725
Abstract
No abstract availableKeywords
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