Charge transport and trapping model for scaled nitride-oxide stacked films
- 1 October 1987
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 30 (1-4), 171-179
- https://doi.org/10.1016/0169-4332(87)90090-0
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- Determination of the Fowler-Nordheim tunneling barrier from nitride to oxide in oxide:nitride dual dielectricIEEE Electron Device Letters, 1986
- Charge Transport and Storage in Metal-Nitride-Oxide-Silicon (MNOS) StructuresJournal of Applied Physics, 1969