Diffusion in Doped UO2
- 1 April 1966
- journal article
- research article
- Published by Taylor & Francis in Nuclear Applications
- Vol. 2 (2), 131-137
- https://doi.org/10.13182/nt66-a27493
Abstract
UO2, both pure and doped with tri-, quadri-, and penta-valent ions, has been labelled with rare gas by means of ion bombardment and reactor irradiation. The gas release at low gas concentrations occurred by a mechanism little or not dependent on self-diffusion of either oxygen or uranium. At high gas concentrations, retarded release of gas occurred. This was shown by transmission electron microscopy to coincide with formation and annealing of radiation-induced bubbles and dislocation loops.Keywords
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